I have a question about the example lithography using alternating phase shift mask.
There is an analysis group called "image_field" In the example file and it includes a monitor called field.
After running the script written in "image_field", the aerial image comes out.
However, there are some sentences in the script don't make sense.
# for simulation N lambda in width, there are 2N+1 propagating orders
ngx=21; # number of propagating grating orders
The monitor area is constrained to the FDTD region, which means that the value 1.93 um (x span) become 1.54 um (FDTD region).
Can anyone explain to me why the ngx and ngy are set to be 21?
大家好，我對於你們提供的例子 lithography using alternating phase shift mask 有些疑問。
但原先在"image_field"中的field monitor因為FDTD的模擬區域大小從1.93um (10倍波長)最後得到1.54um。