关于官网demo中涉及到远场变换的问题

- April 22, 2023 at 2:13 pm
  
  pengrenjuddd
  Subscriber
  
  老师好，
  我在研究官网中二元掩模光刻“Lithography using binary mask”（https://optics.ansys.com/hc/en-us/articles/360042256473-Lithography-using-binary-mask）时有几个问题想请教一下。
  1.官网提供的例子中，在分析组“image_field”的脚本代码里采用了“farfieldpolar3D”得到极坐标系下的远场变换结果。但模型的边界条件是Periodic,周期边界条件难道不应该用gratingpolar来做远场变换吗？
  2.该例子里用farfieldpolar3D得到极坐标结果Er,Et和Ep，然后再计算倾角θ和方位角φ，最后再变换到直角坐标系结果Ex和Ey，为什么不可以直接用farfieldvector3D得到直角坐标系下的结果呢？
- April 25, 2023 at 8:35 am
  
  ChrisLee
  Subscriber
  
  您好，您的思考是有道理的，如下链接供您参考
  https://forum.ansys.com/forums/topic/ansys-insight-zhouqijiegoujieguofenxitoushefanshelusansheyuanchangjiaofenbujinjuchanga/
  https://forum.ansys.com/forums/topic/ansys-insight-%e5%85%b3%e4%ba%8efarfield3d%e8%bf%99%e7%b3%bb%e5%88%97%e6%8c%87%e4%bb%a4%e7%9a%84%e7%bb%86%e8%8a%82%e9%97%ae%e9%a2%98/#latest
  https://optics.ansys.com/hc/en-us/articles/360034914793-Understanding-the-Assume-Periodic-option-in-far-field-projections
  https://optics.ansys.com/hc/en-us/articles/360034394354

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