Electronics

Electronics

Topics relate to HFSS, Maxwell, SIwave, Icepak, Electronics Enterprise and more

Material Removal Rate

    • Atefeh Sadrimofakham
      Subscriber
      Hello eveyone. I am working on wafer simulation in CMP process. Do you know how we can see/gain the results for material removal rate (MRR)?
    • Atefeh Sadrimofakham
      Subscriber

      In Chemical Mechanical Polishing process, we polish a Silicon Oxide/Nitride wafer on the Polyurthane pad. The ununiformity on the wafer surface will be decreased  and flattened based on this process. So, I wonder if is there any possibilty to calculate the amount of the Material Removal Rate from the wafer surface? (It is something like erosion.) https://en.wikipedia.org/wiki/Chemical-mechanical_polishing. Here is more information about the CMP process.

    • Praneeth
      Ansys Employee

      Hi Atefeh,

      Please provide the Ansys tool name that you wish to use to help us serve you better.

      Best regards,
      Praneeth. 

    • Atefeh Sadrimofakham
      Subscriber

      Ansys Fluent

    • Essence
      Ansys Employee

      Hello,

      Did you try using the Ansys Rocky which can be coupled with Ansys Fluent for your application?

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